Diffractive optics based on modulated subwavelength-domain V-ridge gratings

We study the properties of reflection-type V-ridge gratings in the subwavelength domain and describe a method to realize diffractive optical elements by using such gratings as signal carriers. In particular, we utilize a coding scheme based on position modulation of a high-frequency V-ridge carrier grating. We design and demonstrate beam splitting elements using this coding scheme, electron-beam lithography, anisotropic wet etching of silicon, hot embossing of polymer, and metal deposition. These elements have the outstanding property of operating over a large spectral range from 406 to 520nm. The measured diffraction patterns show excellent agreement with theoretical results given by rigorous diffraction theory.